PRNewswire: Axcelis has released an extended energy range option for its Purion XE high energy implanter. This new option was developed specifically to address the emerging needs of the image sensor and specialty device manufacturers. The extended energy range option is scheduled to be available on new systems in the second quarter of 2016.
Bill Bintz, EVP, marketing and engineering, said, "We're excited to be able to offer our customers the ability to perform ultra-high energy implants for next generation image sensor and power device manufacturing. These implants enable extremely precise and very deep doping profiles, for applications that include deep wells. In the case of image sensors, this allows for more effective separation of photodiodes, reduced noise and dark current, and higher quality color."
John Aldeborgh, EVP, customer operations, commented, "Image sensors and specialty devices are two of the fastest growing market segments in IC manufacturing, due to the proliferation of smartphones, tablets and digital cameras. We see significant opportunity for the Purion XE in these very active markets."
The company's Youtube video talks about the implanters for image sensors:
Metal Scaling in BSI ArrayOnce the small pixel world switched to BSI, one might think that metal shifts across the pixel array is a thing of the FSI past. However, Omnivision's patent application US20110266421 "Image sensor having metal reflectors wit…Read More
SiOnyx Wins $3M DoD IR Imaging ContractPR Newswire: SiOnyx won a multiphase contract from the Office of Naval Research (ONR) and Naval Surface Warfare Center Dahlgren Division (NSWC DD) in support of the Detect program to develop next generation sensing technolog…Read More
HDR Imaging: Sensors and ArchitecturesArnaud Darmont, CEO of Aphesa, delivers 1-day course "High Dynamic Range Imaging: Sensors and Architectures" at IS&T/SPIE Electronic Imaging conference on Jan. 22, 2012.The course is going to:describe various approaches to ac…Read More
LFoundry Develops CIS ProcessLFoundry plans to extend its 0.15um process offering with pinned photodiode, BSI and microlens in 2012, so that it becomes a viable CIS foundry:LFoundry was founded in 2008 on the former Renesas fab located in Lands…Read More
IMEC Reports Record QEElectroIQ published IMEC article on BSI process and sensors development. Few interesting quotes from the article:"we were able to make a BSI imager with a record efficiency over a broad spectrum. In the full visible light spe…Read More